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==SPI Mark II== | ==SPI Mark II== | ||
SPI Mark II was a more advanced version of the armor, with numerous upgrades. They had new photo-reactive coating to boost camouflaging properties. There were also numerous experimental refits to gel ballistic layers, upgraded software suites, and other functions. Although the new | SPI Mark II was a more advanced version of the armor, with numerous upgrades. They had new photo-reactive coating to boost camouflaging properties. There were also numerous experimental refits to gel ballistic layers, upgraded software suites, and other functions. Although the new photo-reactive coating could mimic a wide range of EM(Electro Magnetic) radiation, it was still sensitive to overload, which is why it takes the suit a few moments to reset after a flash-bang for example<ref>[[Halo: Ghosts of Onyx]] page 113</ref>.It was proposed in [[2537]], but the request was denied because the armor was over budget. It is weakest at the knees. | ||
SPI Mark II was used by the Drill Instructors for Beta Company, and was first used by SPARTAN-III's in Gamma Company. | SPI Mark II was used by the Drill Instructors for Beta Company, and was first used by SPARTAN-III's in Gamma Company. |
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