Editing Plasma weaponry
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'''Plasma Weaponry''' refers to [[Directed Energy Weapon]]ry that uses [[Plasma]]. The [[Covenant Empire|Covenant]] employ always follows a distinct pattern regardless of the specific gun; it is stabilized using magnetic fields. Without the field, the plasma dissipates too quickly to be of any real use. The field controls and contains the plasma, without interfering with firing. The [[plasma sword]] is an example of this technology, as the magnetic field holds the blade together while allowing it to cut through objects. This is also how the [[plasma pistol]]'s overcharge shot works. A small magnetic generator is installed in the hilt of the pistol and, when fired, the bolt tracks its target using a very simple motion tracking system built into the magnetic generator which alters the field to make the plasma move. A larger version of this effect is seen in the plasma torpedoes of Covenant cruisers. | |||
Plasma | |||
This | This information was obtained by [[Cortana]], a [[UNSC]] [[AI]], while she was in direct contact with a Covenant ship's data core.<ref>''[[Halo: First Strike]]''</ref> | ||
== | ==Artificial Plasma Generation== | ||
To completely describe the state of a plasma, we would need to write down all the | |||
particle locations and velocities and describe the electromagnetic field in the plasma region. | |||
However, it is generally not practical or necessary to keep track of all the particles in a plasma. | |||
Therefore, plasma physicists commonly use less detailed descriptions, of which | |||
there are two main types: | |||
== | ===Fluid model=== | ||
Fluid models describe plasmas in terms of smoothed quantities, like density and averaged velocity around each position (see [[Plasma parameters]]). One simple fluid model, [[magnetohydrodynamics]], treats the plasma as a single fluid governed by a combination of [[Maxwell's equations]] and the [[Navier–Stokes equations]]. A more general description is the [[two-fluid plasma]] picture, where the ions and electrons are described separately. Fluid models are often accurate when collisionality is sufficiently high to keep the plasma velocity distribution close to a [[Maxwell–Boltzmann distribution]]. Because fluid models usually describe the plasma in terms of a single flow at a certain temperature at each spatial location, they can neither capture velocity space structures like beams or [[double layer]]s, nor resolve wave-particle effects. | |||
=== | ===Kinetic model=== | ||
Kinetic models describe the particle velocity distribution function at each point in the plasma and therefore do not need to assume a [[Maxwell–Boltzmann distribution]]. A kinetic description is often necessary for collisionless plasmas. There are two common approaches to kinetic description of a plasma. One is based on representing the smoothed distribution function on a grid in velocity and position. The other, known as the [[particle-in-cell]] (PIC) technique, includes kinetic information by following the trajectories of a large number of individual particles. Kinetic models are generally more computationally intensive than fluid models. The [[Vlasov equation]] may be used to describe the dynamics of a system of charged particles interacting with an electromagnetic field. | |||
In magnetized plasmas, a [[gyrokinetics|gyrokinetic]] approach can substantially reduce the computational expense of a fully kinetic simulation. | |||
=== | Most artificial plasmas are generated by the application of electric and/or magnetic fields. Plasma generated in a laboratory setting and for industrial use can be generally categorized by: | ||
*{{ | *The type of power source used to generate the plasma; DC, RF and microwave. | ||
*The pressure at which they operate; vacuum pressure (< 10 mTorr or 1 Pa), moderate pressure (~ 1 Torr or 100 Pa), atmospheric pressure (760 Torr or 100 kPa). | |||
*The degree of ionization within the plasma; fully ionized, partially ionized, weakly ionized. | |||
*The temperature relationships within the plasma: thermal plasma (''T<sub>e</sub>'' = ''T''<sub>ion</sub> = ''T''<sub>gas</sub>), non-thermal or "cold" plasma (''T<sub>e</sub>'' >> ''T''<sub>ion</sub> = ''T''<sub>gas</sub>) | |||
*The electrode configuration used to generate the plasma. | |||
*The magnetization of the particles within the plasma; Magnetized (both ion and electrons are trapped in [[Gyroradius|Larmor orbits]] by the magnetic field), partially magnetized (the electrons but not the ions are trapped by the magnetic field), non-magnetized (the magnetic field is too weak to trap the particles in orbits but may generate [[Lorentz force]]s). | |||
*Its application | |||
====Low-pressure discharges==== | |||
*''[[Glow discharge]] plasmas'': non-thermal plasmas generated by the application of DC or low frequency RF (<100 kHz) electric field to the gap between two metal electrodes. Probably the most common plasma; this is the type of plasma generated within [[fluorescent light]] tubes.<ref>{{cite web |url=http://www-spof.gsfc.nasa.gov/Education/wfluor.html |title=The Fluorescent Lamp: A plasma you can use. |author=Dr. David P. Stern |accessdate=2010-05-19}}</ref> | |||
*''[[Capacitively coupled plasma]] (CCP)'': similar to glow discharge plasmas, but generated with high frequency RF electric fields, typically 13.56 MHz. These differ from glow discharges in that the sheaths are much less intense. These are widely used in the microfabrication and integrated circuit manufacturing industries for plasma etching and plasma enhanced chemical vapor deposition.<ref>{{cite journal |last1=Sobolewski |first1=M.A. |last2=Langan & Felker |first2=J.G. & B.S. |year=1997 |title=Electrical optimization of plasma-enhanced chemical vapor deposition chamber cleaning plasmas |publisher=J. Vac. Sci. Technol. B |volume=16 |issue=1 |pages=173-182 |url=http://physics.nist.gov/MajResProj/rfcell/Publications/MAS_JVSTB16_1.pdf |}}</ref> | |||
*''[[Inductively coupled plasma]] (ICP)'': similar to a CCP and with similar applications but the electrode consists of a coil wrapped around the discharge volume which inductively excites the plasma.{{Citation needed|date=August 2008}} | |||
*''[[Wave heated plasma]]'': similar to CCP and ICP in that it is typically RF (or microwave), but is heated by both electrostatic and electromagnetic means. Examples are [[helicon discharge]], [[electron cyclotron resonance]] (ECR), and [[ion cyclotron resonance]] (ICR). These typically require a coaxial magnetic field for wave propagation.{{Citation needed|date=August 2008}} | |||
====Atmospheric pressure==== | |||
*''[[Arc discharge]]:'' this is a high power thermal discharge of very high temperature (~10,000 K). It can be generated using various power supplies. It is commonly used in [[Metallurgy|metallurgical]] processes. For example, it is used to melt rocks containing Al<sub>2</sub>O<sub>3</sub> to produce [[aluminium]]. | |||
*''[[Corona discharge]]:'' this is a non-thermal discharge generated by the application of high voltage to sharp electrode tips. It is commonly used in [[ozone]] generators and particle precipitators. | |||
*''[[Dielectric barrier discharge]] (DBD):'' this is a non-thermal discharge generated by the application of high voltages across small gaps wherein a non-conducting coating prevents the transition of the plasma discharge into an arc. It is often mislabeled 'Corona' discharge in industry and has similar application to corona discharges. It is also widely used in the web treatment of fabrics.<ref>{{cite journal|author=F. Leroux et al. |title=Atmospheric air plasma treatments of polyester textile structures|journal=Journal of Adhesion Science and Technology|volume=20|pages=939–957|year=2006|doi=10.1163/156856106777657788}}</ref> The application of the discharge to synthetic fabrics and plastics functionalizes the surface and allows for paints, glues and similar materials to adhere.<ref>{{cite journal|author=F. Leroux et al.|doi=10.1016/j.jcis.2008.09.062|title=Polypropylene film chemical and physical modifications by dielectric barrier discharge plasma treatment at atmospheric pressure|year=2008|journal=Journal of Colloid and Interface Science|volume=328|pages=412|pmid=18930244|issue=2}}</ref> | |||
*''[[Capacitive discharge]]:'' this is a [[nonthermal plasma]] generated by the application of RF power (e.g., 13.56 MHz) to one powered electrode, with a grounded electrode held at a small separation distance on the order of 1 cm. Such discharges are commonly stabilized using a noble gas such as helium or argon | |||
== Starship Weaponry == | |||
*[[Plasma Torpedo]] | |||
*[[Plasma Turret]] | |||
*[[Plasma Charge]] | |||
== | == Ground Weaponry == | ||
=== Mounted Weapons === | |||
*[[Anti-Aircraft Battery]] | |||
*[[Plasma Beam]] | |||
*[[Plasma Mortar]] | |||
*[[Twin Plasma Cannons]] | |||
*[[Type-26 Anti-Infantry Stationary Gun]] | |||
*[[Type-42 Directed Energy Support Weapon]] | |||
*[[Type-52 Directed Energy Support Weapon]] | |||
*Prototype UNSC plasma artillery on the [[M-145D Rhino]] | |||
== | === Handheld Weapons === | ||
*[[Type-1 Energy Weapon/Sword]] | |||
*[[Type-25 Directed Energy Pistol]] | |||
*[[Type-25 Directed Energy Rifle]] | |||
*[[Type-25 Directed Energy Rifle/Jiralhanae Variant]] | |||
*[[Type-51 Directed Energy Rifle/Improved]] | |||
*[[Type-52 Guided Munitions Launcher/Explosive]] | |||
=== Explosives === | |||
*[[Plasma Grenade]] | |||
==Sources== | ==Sources== | ||
<references/> | |||
[[Category:The Covenant]] | |||
[[Category: | [[Category:Technology]] | ||
[[Category: | [[Category:Weapons]] |